Magnetron sputtering
Vacuum magnetron sputtering station Kepler 450
The station is designed for applying coatings by magnetron sputtering.
Manufacturer:
LTD \"Dana Engineering\"
Year: 2019
Vacuum magnetron sputtering station Kepler 450
The station is designed for applying coatings by magnetron sputtering.
Manufacturer:
LTD \"Dana Engineering\"
Year: 2019
Supra 40VP
Zeiss Supra 40VP is a Scanning Electron Microscope with Field Emission cathode, GEMINI electron-optics column, oil-free vacuum system, and variable pressure (VP) operating mode. Unit capabilities are extended with, Gatan MonoCL3+ Spectrometer and Gatan SmartEBIC electron beam induced current (EBIC) registration system.
Manufacturer:
CarlZeiss
Year: 2007
Libra 200FE
Libra 200 FE is an analytical transmission electron microscope for material science. Equipped with high efficient Field Emission cathode and energy Omega-filter it is suitable for high-accuracy measurements of structure and atomic compositional of nano-sized objects at ultimate resolution. Unit capabilities are extended with Oxford Instruments Inca X-max EDX spectrometer and set of sample holders for in-situ experiments.
Manufacturer:
CarlZeiss
Year: 2007
Auriga Laser
Cross-beam SEM-FIB workstation equipped with laser chamber. Unit capabilities are extended with Oxford Instruments AZtecOne EDX spectrometer, Gatan SmartEBIC electron beam induced current (EBIC) registration system and Raith ELPHY Quantum for Electron- and ion- beam lithography
Manufacturer:
CarlZeiss
Year: 2012
Orion +
Scanning Helium Ion Microscope is a device that incorporates both Focused Ion Beam and Scanning Electron Microscopy approaches. Unit capabilities are extended with NanoMaker lithography system
Manufacturer:
CarlZeiss
Year: 2007
Nanoserf
Synthesis of thin films of various compounds (Al2O3, TiO2, ZnO, HfO2, VO2, SnO2 et al.) designed thickness on the surface of flat, \"3D\" substrates and dispersed materials by Atomic Layer Deposition (ALD).3
Manufacturer:
Nanoengineering Ltd., Russia
Year: 2011
Solar-MN
Synthesis of thin films of various compounds (Al2O3, TiO2, ZnO, HfO2, VO2, SnO2 et al.) designed thickness on the surface of flat, \"3D\" substrates and dispersed materials by Atomic Layer Deposition (ALD).
Manufacturer:
Nanoengineering Ltd., Russia
Year: 2011
Manufacturer:
Thermo Fisher Scientific, Inc., Germany
Year: 2012
Solartron 1260/1287
The measuring complex, consisting of a frequency response analyzer (impedance meter) Solartron 1260A, a potentiostat/galvanostat Solartron 1287, a ProboStat measuring cell, a lift furnace and a ProGasMix gas mixture preparation unit, allows for the measurement of electrochemical and electrophysical characteristics of materials in a wide temperature range (up to 1200°C), in various gas environments, in a frequency range from 10 μHz to 32 MHz.
Manufacturer:
Solartron Analytical, Great Britain
Year: 2012
Micromeritics/ASAP 2020 MP
Automated system ASAP 2020MP (Micromeritics) is used to determine the surface area and pore structure study of dispersed materials. The system allows for analysis of micro- and mesopores, their size distribution and surface area determination. Measuring of pores size from 0.35 to 500 nm.
Manufacturer:
Micromeritics Instrument Corporation, USA
Year: 2011