Russia
The Federal Joint Research Center "Material Science and Characterization in Advanced Technology”
Equipment
Complex for local surface analysis using scanning probe microscopy
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Integration of atomic force microscopy (AFM) techniques with Raman spectroscopy techniques. The system is designed for research in an inert atmosphere with nanometer resolution and provides comprehensive data on multiple surface properties of the sample, such as: topography, magnetization, electric potential and work function, friction force, piezoresponse, elasticity, capacitance, leakage current, and much more.
Powder X-ray diffractometer
D2 Phaser
Powder X-ray diffractometry, X-ray phase analysis
Manufacturer:
Bruker
Spherical tokamak
Globus-M
A next-generation spherical tokamak designed to study physical processes in spherical plasma configurations and to develop engineering solutions for megaampere-range spherical tokamaks.
A system for local analysis of structure, atomic composition, and bonding using transmission electron microscopy (TEM)
JEM-2100F
Local analysis of structure, atomic composition, and bonding using high-resolution transmission electron microscopy (HRTEM) and microanalysis.
Manufacturer:
JEOL
High-resolution X-ray diffractometer with rotating anode
D8 Discover
High-resolution X-ray diffractometry
Manufacturer:
Bruker
Electron beam lithography system based on a scanning electron microscope
JSM-7001F
Designed for electron beam lithography and high-resolution scanning electron microscopy (SEM). Capabilities include microstructural analysis: texture analysis, crystallite orientation mapping, phase discrimination and crystalline phase distribution mapping, grain size and shape determination, boundary type analysis, and pole figure construction.
Manufacturer:
JEOL
Stereomicroscope with digital imaging system
SMZ 745T
Optical microscopy with digital imaging
Manufacturer:
Nikon
Setup for investigating temperature-dependent electrophysical and optical parameters of solid-state nanoheterostructures
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Studies using deep-level transient spectroscopy (DLTS) and admittance spectroscopy across a broad temperature range
Ion beam thinning system
Nanomill 1050
Sample preparation for transmission electron microscopy (TEM)
Manufacturer:
Fischione Instruments
Stereoscopic microscope with digital imaging system
Eclipse L150
Optical microscopy with digital imaging
Manufacturer:
Nikon
Secondary ion mass spectrometer (SIMS)
IMS-7f
For measuring the mass of secondary ions generated during layer-by-layer sputtering of the sample by a primary ion beam. The instrument is used for implantation dose monitoring, p-n junction depth profiling, process development, and depth-resolved elemental analysis in materials science, microelectronics, semiconductor technology, geology, biology, medicine, and metallurgy.
Manufacturer:
Cameca
Specialized high-vacuum setup for investigating low-dose ion modification of tungsten
STE IBS
Designed for studying low-dose and low-energy ion modification of tungsten near-surface layers
Fourier-transform infrared spectrometer (FTIR spectrometer)
FT-801
Molecular composition analysis, substance concentration measurement, sample quality control, and investigation of chemical reaction kinetics.
Manufacturer:
Simex
Year: 2021